Patterning of SiO2 film
Patterning of SiO2 film
Through photolithography and etching technology, fine patterning of SiO2 single-layer films and SiO2 + metal oxide films (film thickness 0.1 to 1 μm) is possible. ■Patterning of SiO2 insulating films ■Patterning of decorative laminated films For more details, please contact us.
- Company:KISO WAVE
- Price:Other